As a result of studying the discipline students should:

- to know:
1) mechanisms of interaction of laser radiation with matter;
2) properties of semiconductors in the laser radiation range;
3) properties of structural materials in the laser development zone;
4) the place of laser technology in typical microelectronics technological processes as alternative methods;
5) basic technological operations of industrial and micro-processing of materials with the application of lasers;
6) technical facilities and capabilities of laser technology at the laboratory and industrial level;
7) trends in the development of laser industrial and microtechnology.

- be able to:
1) explain the effects of the interaction of laser radiation with structural materials and electronic technology materials;
2) to calculate and implement the modes of laser target processing;
3) to provide metrological control of technological processes and consequences of processing;
4) design specialized equipment and develop technological processes.

- prerequisites: interaction of electromagnetic radiation with materials;
- co-requisites: quantum electronics and laser technology.

Introduction to laser technology. Laser thermal technology and thermophysical problems of laser industrial technology. Laser thermochemical oxidation processes, the effect of optical discharge plasma on the efficiency of energy input to the material. Systems of beam formation, optics of technological lasers, control of laser radiation parameters. Laser tempering. Laser doping and surfacing. Laser cutting of metals and alloys. Laser welding of metals and alloys. Laser welding of non-metallic materials. Dimensional processing, laser prototyping. Laser marking and engraving. Methods of study of material properties after laser treatment. Resolution of laser processing methods.

1. Bobytskyi Ya.V., Matviishyn G.L. Laser technologies. Part 1: educational accessories. - Lviv: Lviv Polytechnic Pub., 2015. - 320 p.
2. Muravskyi L.I., Voroniak T.I., Kmet A.B. Surface laser interferometry for technical diagnostics: a monograph. - Lviv: Spolom, 2014. - 272 p.
3. Gotra Z.Yu., Bobytskyi Ya.V. Laser processing methods in microelectronics. - Lviv: Svit, 1991. - 168 p.
4. Givargizov E.I. Artificial epitaxy - a promising technology for microelectronics base elements. - M .: Nauka, 1988. - 180 p.
5. Alferov Zh.I. et al. Interference laser annealing of semiconductors // Physics and Engineering of Semiconductors. - 1983 - Vol.17. - PP.235-241.

- Current control (30%): reports on practical works;
- Final control (70%): final testing.